What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

The tech is nothing new, but did you know you can make your own graphene using your DVD burner? No seriously — all you need is a light-scribe compatible DVD burner and some graphite oxide.

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Our goal is to establish reliable supply chains for your MEMS products. We have strong experience... [See More] Capabilities: Dry Etching (Plasma / RIE); Inspection / Testing; Plating; Oxidation / ...

Company Information: Universal Semiconductor Inc is one of the early pioneering semiconductor companies in the world that extended and developed innovative technologies for diverse applications. They ...

such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in nanotechnology for fabricating nanostructures, wet etching relies on liquid ...

The etching and characterization room contains a suite of tools for dry etching and characterization of samples. This includes three dry etchers with a range of capabilities, while characterization ...

Our team at LASER COMPONENTS Canada used inductively coupled plasma-reactive ion etching (ICP-RIE) to achieve precise waveguide trench geometries with sidewall angles of 60 ° to 70 ...

Hackaday editors Elliot Williams and Mike Szczys marvel at the dangerous projects on display this week, including glass etching with ... discuss the potential for graphene in hard drives, and ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...